ad3pa | International Workshop on Advanced 3D Patterning

Making an impact!

Welcome to ad3pa

This is a new workshop organized in Dresden to bring together scientists and industry representatives with common interests in the growing field of high-resolution 3D patterning by combining both classical top-down lithography as well as alternative pattern formation methods like bottom-up self-organization concepts. We are posting also regularly information on advanced 3D patterning events we are involved.

NEWS

21.03.2018 At these days, we are putting together the program for ad3pa18 - the 2nd International Workshop on Advanced 3D Patterning to be held in Dresden from 4th to 5th of October 2018. Stay tuned for more details coming soon.

19.03.2018 The two sessions KFM23 and KFM26 at the DPG Sping Meetign in Berlin (DPGBER18) on topics ranging from 3D to 2D lithography, fabrication and characterization brought inspiring talks and productive discussions with a great audience. Great to have been a part of it!


31.01.2018 The program for the joint lithograpgy session of the DPG sections Thin Films (DS) and Crystalline Solids and their Microstructure (KFM) is now online for the DPG Spring meeting in Berlin (11 March - 16 March 2018: http://berlin18.dpg-tagungen.de). Follow the links below for more details

Lithography I (DS) | Lithography II (DS) | Lithography III (KFM) | Lithography IV (KFM)

19.01.2018 This year, the DPG Spring Meeting of the Condensed Matter Section in Berlin (11 March - 16 March 2018: http://berlin18.dpg-tagungen.de) will feature a quite strong program on 3D Fabrication and Lithography. The DPG sections on Thin Films and Crystalline Solids and their Microstructure formed a joint lithography session (Lithography I-IV) with total 4 sessions on 2 consecutive days. The main topics are high-resolution 3D printing by (a) focused electron and ion beam processing using direct deposition and resist based methods, (b) by multi-photon absorption and (c) by thermal scanning probe patterning. Additional contributions on (d) novel, advanced lithography and characterization techniques make a unique program. We are very happy to contribute 2 sub-sessions in this joint effort. Thank you to all that made this possible.

18.12.2017 We are organizing a special session dedicated to High resolution 3D and Advanced Lithography within the framwork of the DPG Spring Meeting of the Condensed Matter Section (SKM) held together with the EPS in Berlin from 11 March - 16 March 2018 (http://berlin18.dpg-tagungen.de) as part of the section on Crystalline Solids and their Microstructure. Stay tuned for more details coming soon.

18.10.2017 Just one thing: Thank you to all 57 participants of the ad3pa 2017 workshop on Advanced 3D Patterning - you made it an inspiring and successful event. I am looking forward to the upcoming year and more great 3D work.


18.09.2017 We updated all details on the conference venue. Please have a look at Location for more details.

16.09.2017 We would like to thank all our supporters for making this event possible, this includes first of all of course all speakers and guests but especially all our industrial partners for their strong commitment and trust in this new event series.



28.08.2017 We used the last weeks to refine the program even further and believe that it will give you many inputs and insights into 3D patterning technologies. The program will also provide an ideal platform and has enough space to discuss the future of advanced 3D patterning methods and new projects. If you are just starting in this field: come to ad3pa!!! You will get a comprehensive overview on leading technologies and we will benefit from your perspective and background.  

27.06.2017 An inspiring list of invited speakers already confirmed their workshop participation and the first preliminary program is now online. It is worth having a look and considering to participate in this dedicated 3D workshop. The workshop registration is also open now - register today.

19.05.2017 First speakers confirmed their participation. Amongst others, Prof. H.-C. Scheer (Bergische Universität Wuppertal, DE), Dr. H. Schift (Paul Scherrer Institut, CH), Dr. Z. Wu (SwissLitho AG, CH) as well as Dr. A. Schleunitz (micro resist technology GmbH, DE) will discuss recent developments in the field of technologies and materials for high-resolution 3D lithography. More information will follow in the next days. Please, visit us again.




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